This equiptment will mainly to restore the graphite electrode pretreatment during the producing line of the polysilicon.After the pickling process and parched through the high temperature,the rest water vapor and potassium chloride were discharged from the furnace along with the carrier gas after High-temperature vacuum calcinations.We have two models of top loading and bottom loading of this device.It was deploied PLC and HMI so that wo can control it automatically.This device was well accepted for convenient operation and strong degassing function.
1. rated power 100KW£¬150KW
2.working zone size
¦µ320”Į400£Ø heated by graphite rod£©
¦µ500”Į550£Øheated by graphite rod£©
3.rated temperature1650℃
4.Ultimate vacuum 6*10-3Pa
5.protective atmosphere Ar ӢN2
structure explanation
Be made up of furnace coverӢfurnaceӢfurnace bottom Ӣoven rack Ӣ platformӢvacuum system and electrical control system.
Characteristic: the inside of the furnace is installed a purification of graphite
The insulation is made up of grapjite felt which is heated under 2000℃
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